DocumentCode
1067461
Title
Analysis of a junction termination structure for ideal breakdown voltage in p-n junction devices
Author
Tanaka, Tomoyuki ; Mochizuki, Yasuhiro ; Okamura, Masahiro
Author_Institution
Hitachi Ltd, Hitachi, Ibaraki, Japan
Volume
27
Issue
1
fYear
1980
fDate
1/1/1980 12:00:00 AM
Firstpage
261
Lastpage
265
Abstract
Electric-field distribution and avalanche breakdown voltage in reverse-biased p-n junction devices having a concave p-n junction termination structure are analyzed by a two-dimensional numerical method. It is shown that there are two peaks in the electric field of the device. One peak, near the p-n junction edge, is smaller than the other peak, found in the one-dimensional region, so that an ideal breakdown voltage can be obtained. This desirable feature comes partly from the excessive spreading of the depletion layer around the p-n junction edge due to the concave junction shape. One of the merits of this junction termination structure is that the allowable range of device parameters for the ideal breakdown voltage is much wider than for any other junction termination structure. Experimental breakdown voltage of a diode with the concave p-n junction structure agrees well with the ideal breakdown voltage calculated in the one-dimensional region of the device.
Keywords
Avalanche breakdown; Breakdown voltage; Diodes; Etching; Fabrication; Geometry; Impurities; P-n junctions; Shape; Thyristors;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1980.19848
Filename
1480641
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