Title :
The gated-access MNOS memory transistor
Author :
Wegener, H.A.Richard
Author_Institution :
Hewlett-Packard Laboratories, Palo Alto, CA
fDate :
1/1/1980 12:00:00 AM
Abstract :
A new modification of the MNOS transistor results in significant advantages. It combines a depletion-mode channel with electrically separate electrodes over the memory portion and the fixed threshold portion of a step-gate device. This elimnates read disturb during interrogation; therefore, much longer retention is now possible. It also decreases access time within an LSI array. For block-written EAROM´s, a new form of dynamic inhibit makes memory array isolation unnecessary. These and other improvements obtained with this structure do not require new processes or a significant increase in size.
Keywords :
Aluminum; Chemical processes; Dielectrics; Electrodes; Etching; Protection; Resists; Silicon; Threshold voltage; Writing;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1980.19849