• DocumentCode
    1067479
  • Title

    Prebreakdown phenomena in GaAs epitaxial layers and FET´s

  • Author

    Tsironis, Christos

  • Author_Institution
    University of Aachen, Aachen, Germany
  • Volume
    27
  • Issue
    1
  • fYear
    1980
  • fDate
    1/1/1980 12:00:00 AM
  • Firstpage
    277
  • Lastpage
    282
  • Abstract
    Several phenomena in GaAs field-effect transistors (FET´s) which are present at higher voltages, such as light emission, noise power eruptions, and excess interface and substrate current flow, depend on the presence of a buffer layer between the active layer and the substrate as well as the epi-layer thickness below the positive ohmic contact. The origin of the light emission and the noise power is impact ionization in the high-field region near the drain contact. The excess current flow after saturation is primarily due to avalanche multiplication and breakdown of the space-charge layer at the interface between active layer and substrate. This space-charge layer is caused by trapped electrons at the interface between epi-layer and substrate. The electric-field strength and the current density in this critical region below the drain contact control the prebreakdown effects and precede the device burnout.
  • Keywords
    Active noise reduction; Avalanche breakdown; Buffer layers; Epitaxial layers; FETs; Gallium arsenide; Impact ionization; Ohmic contacts; Substrates; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1980.19850
  • Filename
    1480643