DocumentCode
1067479
Title
Prebreakdown phenomena in GaAs epitaxial layers and FET´s
Author
Tsironis, Christos
Author_Institution
University of Aachen, Aachen, Germany
Volume
27
Issue
1
fYear
1980
fDate
1/1/1980 12:00:00 AM
Firstpage
277
Lastpage
282
Abstract
Several phenomena in GaAs field-effect transistors (FET´s) which are present at higher voltages, such as light emission, noise power eruptions, and excess interface and substrate current flow, depend on the presence of a buffer layer between the active layer and the substrate as well as the epi-layer thickness below the positive ohmic contact. The origin of the light emission and the noise power is impact ionization in the high-field region near the drain contact. The excess current flow after saturation is primarily due to avalanche multiplication and breakdown of the space-charge layer at the interface between active layer and substrate. This space-charge layer is caused by trapped electrons at the interface between epi-layer and substrate. The electric-field strength and the current density in this critical region below the drain contact control the prebreakdown effects and precede the device burnout.
Keywords
Active noise reduction; Avalanche breakdown; Buffer layers; Epitaxial layers; FETs; Gallium arsenide; Impact ionization; Ohmic contacts; Substrates; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1980.19850
Filename
1480643
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