DocumentCode :
1067755
Title :
An analysis and the fabrication technology of the lambda bipolar transistor
Author :
Wu, Ching-Yuan ; Wu, Chung-Yu
Author_Institution :
National Chiao-Tung University, Hsin-Chu, Taiwan, Republic of China
Volume :
27
Issue :
2
fYear :
1980
fDate :
2/1/1980 12:00:00 AM
Firstpage :
414
Lastpage :
419
Abstract :
A new type of voltage-controlled negative-differential-resistance device using the merged integrated circuit of an n-p-n (p-n-p) bipolar transistor and an n(p)-channel enhancement MOSFET, which is called the Lambda bipolar transistor, is studied both experimentally and theoretically. The principal operation of the Lambda bipolar transistor is characterized by the simple circuit model and device physics. The important device properties such as the peak voltage, the peak current, the valley voltage, and the negative differential resistance, are derived in terms of the known device parameters. Comparisons between the characteristics of the fabricated devices and the theoretical model are made, which show that the analysis is in good agreement with the observed device characteristics.
Keywords :
Bipolar integrated circuits; Bipolar transistors; Fabrication; Integrated circuit technology; MOSFET circuits; Physics; Radiative recombination; Semiconductor diodes; Surface resistance; Voltage control;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1980.19877
Filename :
1480670
Link To Document :
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