DocumentCode :
1069122
Title :
An improved definition for the onset of heavy inversion in an MOS structure with nonuniformly doped semiconductors
Author :
Nishida, Masanori ; Aoyama, Masashige
Author_Institution :
Tokyo Sanyo Electric Company Limited, Gumma-ken, Japan
Volume :
27
Issue :
7
fYear :
1980
fDate :
7/1/1980 12:00:00 AM
Firstpage :
1222
Lastpage :
1230
Abstract :
The criterion for the onset of heavy inversion in an MOS structure with nonuniformly doped semiconductors on the basis of an appropriate definition has been derived. The present theoretical model is based upon the improved depletion approximation presented previously by one of authors [ 1]. The validity of the present criterion is confirmed compared with the results obtained from the present model and those obtained from the numerical solutions by assuming appropriate impurity distributions as a test sample. The results obtained from the present model are in excellent agreement with the numerically computed results.
Keywords :
Analytical models; Capacitance-voltage characteristics; Fabrication; Ion implantation; MOS capacitors; MOS devices; Semiconductor impurities; Testing;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1980.20012
Filename :
1480805
Link To Document :
بازگشت