• DocumentCode
    1069122
  • Title

    An improved definition for the onset of heavy inversion in an MOS structure with nonuniformly doped semiconductors

  • Author

    Nishida, Masanori ; Aoyama, Masashige

  • Author_Institution
    Tokyo Sanyo Electric Company Limited, Gumma-ken, Japan
  • Volume
    27
  • Issue
    7
  • fYear
    1980
  • fDate
    7/1/1980 12:00:00 AM
  • Firstpage
    1222
  • Lastpage
    1230
  • Abstract
    The criterion for the onset of heavy inversion in an MOS structure with nonuniformly doped semiconductors on the basis of an appropriate definition has been derived. The present theoretical model is based upon the improved depletion approximation presented previously by one of authors [ 1]. The validity of the present criterion is confirmed compared with the results obtained from the present model and those obtained from the numerical solutions by assuming appropriate impurity distributions as a test sample. The results obtained from the present model are in excellent agreement with the numerically computed results.
  • Keywords
    Analytical models; Capacitance-voltage characteristics; Fabrication; Ion implantation; MOS capacitors; MOS devices; Semiconductor impurities; Testing;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1980.20012
  • Filename
    1480805