DocumentCode
1069122
Title
An improved definition for the onset of heavy inversion in an MOS structure with nonuniformly doped semiconductors
Author
Nishida, Masanori ; Aoyama, Masashige
Author_Institution
Tokyo Sanyo Electric Company Limited, Gumma-ken, Japan
Volume
27
Issue
7
fYear
1980
fDate
7/1/1980 12:00:00 AM
Firstpage
1222
Lastpage
1230
Abstract
The criterion for the onset of heavy inversion in an MOS structure with nonuniformly doped semiconductors on the basis of an appropriate definition has been derived. The present theoretical model is based upon the improved depletion approximation presented previously by one of authors [ 1]. The validity of the present criterion is confirmed compared with the results obtained from the present model and those obtained from the numerical solutions by assuming appropriate impurity distributions as a test sample. The results obtained from the present model are in excellent agreement with the numerically computed results.
Keywords
Analytical models; Capacitance-voltage characteristics; Fabrication; Ion implantation; MOS capacitors; MOS devices; Semiconductor impurities; Testing;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1980.20012
Filename
1480805
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