DocumentCode :
1069212
Title :
A new planar injection-gated bulk switching device based upon deep impurity trapping
Author :
Kapoor, Ashok K. ; Henderson, Thurman H.
Author_Institution :
University of Cincinnati, Cincinnati, OH
Volume :
27
Issue :
7
fYear :
1980
fDate :
7/1/1980 12:00:00 AM
Firstpage :
1268
Lastpage :
1274
Abstract :
Under the proper conditions, double-injection (DI) diodes with partially compensated deep impurities will exhibit "S"-type switching characteristics similar to conventional silicon-controlled rectifiers (SCR\´s). A practical injection-gating scheme has been achieved for the first time in a planar configuration to control the switching behavior of these devices, marked by extreme sensitivity of the gate over a range of switching voltages. An experiment to demonstrate the feasibility of these devices for practical application is described. Finally, a phenomenological explanation is presented for the gate-controlled switching of these devices.
Keywords :
Cathodes; Charge carrier processes; Conducting materials; Current-voltage characteristics; Diodes; Electron traps; Gold; Impurities; Threshold voltage; Voltage control;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1980.20019
Filename :
1480812
Link To Document :
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