• DocumentCode
    1069212
  • Title

    A new planar injection-gated bulk switching device based upon deep impurity trapping

  • Author

    Kapoor, Ashok K. ; Henderson, Thurman H.

  • Author_Institution
    University of Cincinnati, Cincinnati, OH
  • Volume
    27
  • Issue
    7
  • fYear
    1980
  • fDate
    7/1/1980 12:00:00 AM
  • Firstpage
    1268
  • Lastpage
    1274
  • Abstract
    Under the proper conditions, double-injection (DI) diodes with partially compensated deep impurities will exhibit "S"-type switching characteristics similar to conventional silicon-controlled rectifiers (SCR\´s). A practical injection-gating scheme has been achieved for the first time in a planar configuration to control the switching behavior of these devices, marked by extreme sensitivity of the gate over a range of switching voltages. An experiment to demonstrate the feasibility of these devices for practical application is described. Finally, a phenomenological explanation is presented for the gate-controlled switching of these devices.
  • Keywords
    Cathodes; Charge carrier processes; Conducting materials; Current-voltage characteristics; Diodes; Electron traps; Gold; Impurities; Threshold voltage; Voltage control;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1980.20019
  • Filename
    1480812