Title :
Analysis of the role of high-brightness electron guns in lithography
Author_Institution :
University of Houston, Houston, TX
fDate :
8/1/1980 12:00:00 AM
Abstract :
The development of reliable, high-brightness, temperature-field (TF) emission electron guns promises greater flexibility in electron-beam lithography. Detailed pattern analysis of two IC mask sets was performed for the purpose of identifying those areas of electron-beam lithography where high-brightness guns could be applied to advantage. Potential exists for throughput improvement in both Variable Shaped Spot (VSS) Vector Scanning Systems and in ultra-high-speed Raster Scanning Systems.
Keywords :
Electron guns; Fabrication; Helium; Integrated circuit reliability; Lithography; Pattern analysis; Throughput; Variable structure systems; Very high speed integrated circuits; Very large scale integration;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1980.20059
