DocumentCode :
1069811
Title :
Single 5-V, 64K RAM with scaled-down MOS structure
Author :
Masuda, Hiroo ; Hori, Ryoichi ; Kamigaki, Yoshiaki ; Itoh, Kiyoo
Author_Institution :
Hitachi, Ltd., Tokyo, Japan
Volume :
27
Issue :
8
fYear :
1980
fDate :
8/1/1980 12:00:00 AM
Firstpage :
1607
Lastpage :
1612
Abstract :
A single 5-V, 64K RAM was designed and fabricated using double poly-Si and 3-µm process technologies. The design features of this dynamic RAM are described. In particular, memory-cell layout and the on-chip bias generator are designed to realize a marginal single 5-V RAM. The fabricated device provides a typical access time of 120 ns and an operating power of 170 mW. Extensive measurements of the 64K RAM and studies of scaled devices are presented. In line with these studies, scaling of RAM performances is discussed in terms of a scaled-down process and power-supply voltage.
Keywords :
Aluminum; Capacitance; DRAM chips; Design engineering; Dynamic voltage scaling; Power engineering and energy; Power system reliability; Process design; Random access memory; Read-write memory;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1980.20078
Filename :
1480871
Link To Document :
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