• DocumentCode
    1069989
  • Title

    Impact Ionization Noise in SiGe HBTs: Comparison of Device and Compact Modeling With Experimental Results

  • Author

    Sakalas, Paulius ; Ramonas, Mindaugas ; Schröter, Michael ; Jungemann, Christoph ; Shimukovitch, Artur ; Kraus, Wolfgang

  • Volume
    56
  • Issue
    2
  • fYear
    2009
  • Firstpage
    328
  • Lastpage
    336
  • Abstract
    The noise behavior resulting from impact ionization (II) was investigated at room temperature for silicon-germanium (SiGe) heterojunction bipolar transistors with box Ge profile ("true" HBTs), featuring a maximum transit frequency of fT = 80 GHz. Noise parameters (NPs) were measured over a wide range of collector-emitter voltages. Modeling was performed using a generalized hydrodynamic (HD) device simulation with a local temperature approach for avalanche generation, drift- diffusion (DD) simulation with a local field model, and the compact model (CM) HICUM/L2 with a conventional local field Chynoweth\´s law for avalanche generation. Local temperature model parameters were calibrated by matching the avalanche multiplication factor (M) to results obtained from full-band Monte Carlo (MC) simulations. The spectral density of II current noise, obtained from the CM, is in fair agreement with the HD model. Verification of NPs (NFmin, Rn, and GammaOPT), obtained with compact and HD model, against experimental values proved that the weak avalanche model is accurate enough to capture II noise in investigated SiGe HBTs.
  • Keywords
    BiCMOS integrated circuits; Ge-Si alloys; Monte Carlo methods; heterojunction bipolar transistors; impact ionisation; semiconductor device models; semiconductor device noise; semiconductor materials; BiCMOS technology; SiGe; avalanche generation; avalanche multiplication factor; compact model HICUM/L2; drift-diffusion simulation; frequency 80 GHz; full-band Monte Carlo simulations; generalized hydrodynamic device simulation; heterojunction bipolar transistors; impact ionization noise; local field Chynoweth law; noise parameters; silicon-germanium HBT; spectral density; Frequency; Germanium silicon alloys; Heterojunction bipolar transistors; High definition video; Hydrodynamics; Impact ionization; Noise measurement; Silicon germanium; Temperature; Voltage; Avalanche multiplication factor; HICUM; impact ionization (II); noise parameters (NPs); silicon–germanium (SiGe) HBT;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2008.2010578
  • Filename
    4752754