DocumentCode :
1070186
Title :
Unusual phenomena in CVD SiO2under sustained electron bombardment
Author :
Dobkin, Daniel M. ; Kane, Ronald J.
Author_Institution :
Watkins-Johnson Company, Palo Alto, CA
Volume :
27
Issue :
9
fYear :
1980
fDate :
9/1/1980 12:00:00 AM
Firstpage :
1841
Lastpage :
1843
Abstract :
SEM observations of passivating oxide after roughly 100 h of exposure to 10-12-keV, 1-10-mA/cm2electrons disclosed several unexpected phenomena, including smoothing and removal of the surface, perforation of the layer, and the growth of filaments at the edges of the illuminated regions. Possible explanations for the above are discussed.
Keywords :
Capacitance; Electron devices; Flowcharts; Photonic band gap; Scanning electron microscopy; Semiconductor diodes; Smoothing methods; Solid state circuits; Surface topography; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1980.20114
Filename :
1480907
Link To Document :
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