• DocumentCode
    107054
  • Title

    Smoothing of Discharge Inhomogeneities at High Currents in Gasless High Power Impulse Magnetron Sputtering

  • Author

    Andersson, Jon ; Ni, Pavel ; Anders, Andre

  • Author_Institution
    Centre for Quantum Technol., Nat. Univ. of Singapore, Singapore, Singapore
  • Volume
    42
  • Issue
    10
  • fYear
    2014
  • fDate
    Oct. 2014
  • Firstpage
    2856
  • Lastpage
    2857
  • Abstract
    The discharges in high-power impulse magnetron sputtering (HiPIMS) have been reported to consist of azimuthally inhomogeneous plasma with locally increased light emission. The luminous zones seemingly travel around the racetrack and are implicated in generation of the high ion kinetic energies observed in HiPIMS. We show that the inhomogeneities smooth out at high discharge current to yield azimuthally homogeneous plasma. This may have implications for the spatial and kinetic energy distribution of sputtered particles, and therefore also on the thin films deposited by HiPIMS.
  • Keywords
    discharges (electric); plasma applications; plasma diagnostics; sputtering; HiPIMS; azimuthally homogeneous plasma; azimuthally inhomogeneous plasma; discharge inhomogeneities; gasless high-power impulse magnetron sputtering; high-discharge current; high-ion kinetic energies; light emission; luminous zones; sputtered particle kinetic energy distribution; sputtered particle spatial distribution; thin films; Discharges (electric); Magnetic resonance imaging; Nickel; Nonhomogeneous media; Plasmas; Smoothing methods; Sputtering; Plasma diagnostics; plasma materials processing; plasma measurements; plasma sources; plasma stability;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2014.2334600
  • Filename
    6862913