DocumentCode
107054
Title
Smoothing of Discharge Inhomogeneities at High Currents in Gasless High Power Impulse Magnetron Sputtering
Author
Andersson, Jon ; Ni, Pavel ; Anders, Andre
Author_Institution
Centre for Quantum Technol., Nat. Univ. of Singapore, Singapore, Singapore
Volume
42
Issue
10
fYear
2014
fDate
Oct. 2014
Firstpage
2856
Lastpage
2857
Abstract
The discharges in high-power impulse magnetron sputtering (HiPIMS) have been reported to consist of azimuthally inhomogeneous plasma with locally increased light emission. The luminous zones seemingly travel around the racetrack and are implicated in generation of the high ion kinetic energies observed in HiPIMS. We show that the inhomogeneities smooth out at high discharge current to yield azimuthally homogeneous plasma. This may have implications for the spatial and kinetic energy distribution of sputtered particles, and therefore also on the thin films deposited by HiPIMS.
Keywords
discharges (electric); plasma applications; plasma diagnostics; sputtering; HiPIMS; azimuthally homogeneous plasma; azimuthally inhomogeneous plasma; discharge inhomogeneities; gasless high-power impulse magnetron sputtering; high-discharge current; high-ion kinetic energies; light emission; luminous zones; sputtered particle kinetic energy distribution; sputtered particle spatial distribution; thin films; Discharges (electric); Magnetic resonance imaging; Nickel; Nonhomogeneous media; Plasmas; Smoothing methods; Sputtering; Plasma diagnostics; plasma materials processing; plasma measurements; plasma sources; plasma stability;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2014.2334600
Filename
6862913
Link To Document