DocumentCode :
107054
Title :
Smoothing of Discharge Inhomogeneities at High Currents in Gasless High Power Impulse Magnetron Sputtering
Author :
Andersson, Jon ; Ni, Pavel ; Anders, Andre
Author_Institution :
Centre for Quantum Technol., Nat. Univ. of Singapore, Singapore, Singapore
Volume :
42
Issue :
10
fYear :
2014
fDate :
Oct. 2014
Firstpage :
2856
Lastpage :
2857
Abstract :
The discharges in high-power impulse magnetron sputtering (HiPIMS) have been reported to consist of azimuthally inhomogeneous plasma with locally increased light emission. The luminous zones seemingly travel around the racetrack and are implicated in generation of the high ion kinetic energies observed in HiPIMS. We show that the inhomogeneities smooth out at high discharge current to yield azimuthally homogeneous plasma. This may have implications for the spatial and kinetic energy distribution of sputtered particles, and therefore also on the thin films deposited by HiPIMS.
Keywords :
discharges (electric); plasma applications; plasma diagnostics; sputtering; HiPIMS; azimuthally homogeneous plasma; azimuthally inhomogeneous plasma; discharge inhomogeneities; gasless high-power impulse magnetron sputtering; high-discharge current; high-ion kinetic energies; light emission; luminous zones; sputtered particle kinetic energy distribution; sputtered particle spatial distribution; thin films; Discharges (electric); Magnetic resonance imaging; Nickel; Nonhomogeneous media; Plasmas; Smoothing methods; Sputtering; Plasma diagnostics; plasma materials processing; plasma measurements; plasma sources; plasma stability;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2014.2334600
Filename :
6862913
Link To Document :
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