DocumentCode :
1071157
Title :
Domain walls in antiferromagnetically coupled multi-layered films
Author :
Fujiwara, Hideo
Author_Institution :
Alabama Univ., Tuscaloosa, AL, USA
Volume :
29
Issue :
6
fYear :
1993
fDate :
11/1/1993 12:00:00 AM
Firstpage :
2557
Lastpage :
2559
Abstract :
Energy comparison between Neel type and Bloch type walls is performed for antiferromagnetically coupled multilayered magnetic thin films. For the derivation of energy formulae, the coupling is dealt with as an effective field, Hs, which acts as a kind of uniaxial anisotropy. This causes substantial reduction in the width of the walls in the Neel and the Bloch types and an increase in the wall energy. Energy calculations are performed for [2 nm Co/1 nm Cu] multilayered films. It is confirmed that for higher Hs than about 8 kOe, there is a possibility of forming such Block types walls, as the magnetizations in the adjacent layers point antiparallel to each other. These are named antiparallel Bloch walls
Keywords :
antiferromagnetic properties of substances; cobalt; copper; magnetic anisotropy; magnetic domain walls; magnetic multilayers; magnetic thin films; magnetisation; 1 nm; 2 nm; Co-Cu multilayered film; Neel wall; antiferromagnetically coupled multilayered film; antiparallel Bloch walls; energy formulae; magnetic domain walls; magnetic thin films; magnetizations; uniaxial anisotropy; wall energy; Antiferromagnetic materials; Couplings; Giant magnetoresistance; Magnetic anisotropy; Magnetic domain walls; Magnetic domains; Magnetic films; Magnetostatics; Perpendicular magnetic anisotropy; Saturation magnetization;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.280955
Filename :
280955
Link To Document :
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