• DocumentCode
    1071157
  • Title

    Domain walls in antiferromagnetically coupled multi-layered films

  • Author

    Fujiwara, Hideo

  • Author_Institution
    Alabama Univ., Tuscaloosa, AL, USA
  • Volume
    29
  • Issue
    6
  • fYear
    1993
  • fDate
    11/1/1993 12:00:00 AM
  • Firstpage
    2557
  • Lastpage
    2559
  • Abstract
    Energy comparison between Neel type and Bloch type walls is performed for antiferromagnetically coupled multilayered magnetic thin films. For the derivation of energy formulae, the coupling is dealt with as an effective field, Hs, which acts as a kind of uniaxial anisotropy. This causes substantial reduction in the width of the walls in the Neel and the Bloch types and an increase in the wall energy. Energy calculations are performed for [2 nm Co/1 nm Cu] multilayered films. It is confirmed that for higher Hs than about 8 kOe, there is a possibility of forming such Block types walls, as the magnetizations in the adjacent layers point antiparallel to each other. These are named antiparallel Bloch walls
  • Keywords
    antiferromagnetic properties of substances; cobalt; copper; magnetic anisotropy; magnetic domain walls; magnetic multilayers; magnetic thin films; magnetisation; 1 nm; 2 nm; Co-Cu multilayered film; Neel wall; antiferromagnetically coupled multilayered film; antiparallel Bloch walls; energy formulae; magnetic domain walls; magnetic thin films; magnetizations; uniaxial anisotropy; wall energy; Antiferromagnetic materials; Couplings; Giant magnetoresistance; Magnetic anisotropy; Magnetic domain walls; Magnetic domains; Magnetic films; Magnetostatics; Perpendicular magnetic anisotropy; Saturation magnetization;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.280955
  • Filename
    280955