DocumentCode
1071157
Title
Domain walls in antiferromagnetically coupled multi-layered films
Author
Fujiwara, Hideo
Author_Institution
Alabama Univ., Tuscaloosa, AL, USA
Volume
29
Issue
6
fYear
1993
fDate
11/1/1993 12:00:00 AM
Firstpage
2557
Lastpage
2559
Abstract
Energy comparison between Neel type and Bloch type walls is performed for antiferromagnetically coupled multilayered magnetic thin films. For the derivation of energy formulae, the coupling is dealt with as an effective field, H s, which acts as a kind of uniaxial anisotropy. This causes substantial reduction in the width of the walls in the Neel and the Bloch types and an increase in the wall energy. Energy calculations are performed for [2 nm Co/1 nm Cu] multilayered films. It is confirmed that for higher H s than about 8 kOe, there is a possibility of forming such Block types walls, as the magnetizations in the adjacent layers point antiparallel to each other. These are named antiparallel Bloch walls
Keywords
antiferromagnetic properties of substances; cobalt; copper; magnetic anisotropy; magnetic domain walls; magnetic multilayers; magnetic thin films; magnetisation; 1 nm; 2 nm; Co-Cu multilayered film; Neel wall; antiferromagnetically coupled multilayered film; antiparallel Bloch walls; energy formulae; magnetic domain walls; magnetic thin films; magnetizations; uniaxial anisotropy; wall energy; Antiferromagnetic materials; Couplings; Giant magnetoresistance; Magnetic anisotropy; Magnetic domain walls; Magnetic domains; Magnetic films; Magnetostatics; Perpendicular magnetic anisotropy; Saturation magnetization;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.280955
Filename
280955
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