Title :
WA-A3 formation of n-p-n structures by a combination of double implantation and single-pulse laser annealing
Author :
Tamura, Masato ; Ohkura, Michiko ; Natsuaki, N. ; Tokuyama, Takeshi
fDate :
11/1/1980 12:00:00 AM
Keywords :
Annealing; Atomic beams; Atomic layer deposition; Diffusion processes; Impurities; Laboratories; Lattices; Optical pulses; Silicon; Solids;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1980.20222
