DocumentCode :
1071326
Title :
WA-A5 a new doping technique without SiO2patterning using an inorganic photoresist
Author :
Yoshikawa, Akira ; Takeda, Akiko ; Mizushima, Y.
Volume :
27
Issue :
11
fYear :
1980
fDate :
11/1/1980 12:00:00 AM
Firstpage :
2194
Lastpage :
2194
Keywords :
Amorphous materials; Amorphous semiconductors; Atomic layer deposition; Doping; FETs; Impurities; Laboratories; Polymer films; Resists; Surface treatment;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1980.20226
Filename :
1481019
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1071326
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