DocumentCode

1071459

Title

WP-A3 Application of CW argon laser annealing on fabricating short-channel PolySilicon-gate MOSFET´s

Author

Palkuti, L.J. ; Teng, T.C. ; Skinner, C.

Volume

27

Issue

11

fYear

1980

fDate

11/1/1980 12:00:00 AM

Firstpage

2198

Lastpage

2199

Keywords

Annealing; Argon; Diodes; Electron beams; Laser sintering; Leakage current; Scanning electron microscopy; Silicon; Temperature; Threshold voltage;

fLanguage

English

Journal_Title

Electron Devices, IEEE Transactions on

Publisher

ieee

ISSN

0018-9383

Type

jour

DOI

10.1109/T-ED.1980.20238

Filename

1481031