• DocumentCode
    1071469
  • Title

    WP-A4 properties of silicon p-n junction diodes processed with a scanned electron beam

  • Author

    Johnson, Noble M. ; Sinclair, Robert

  • Volume
    27
  • Issue
    11
  • fYear
    1980
  • fDate
    11/1/1980 12:00:00 AM
  • Firstpage
    2199
  • Lastpage
    2199
  • Keywords
    Amorphous materials; Annealing; Electron beams; Electron mobility; Laboratories; P-n junctions; Scanning electron microscopy; Schottky diodes; Silicon; Very large scale integration;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1980.20239
  • Filename
    1481032