DocumentCode

1071495

Title

WP-A6 an ion-implanted Ti-W silicon Schottky-barrier diode

Author

Li, S.S. ; Kim, Jong Soo ; Kreps, S.A.

Volume

27

Issue

11

fYear

1980

fDate

11/1/1980 12:00:00 AM

Firstpage

2200

Lastpage

2200

Keywords

Boron; Implants; Ion implantation; MESFETs; Schottky diodes; Semiconductor diodes; Semiconductor process modeling; Silicon; Substrates; Tungsten;

fLanguage

English

Journal_Title

Electron Devices, IEEE Transactions on

Publisher

ieee

ISSN

0018-9383

Type

jour

DOI

10.1109/T-ED.1980.20242

Filename

1481035