Title :
Magnetoresistance mobility profiling of MESFET channels
Author :
Sites, James R. ; Wieder, H.H.
Author_Institution :
Naval Ocean Systems Center, San Diego, CA
fDate :
12/1/1980 12:00:00 AM
Abstract :
Magnetoresistance provides an alternative, nondestructive technique for determining the carrier mobility in the conducting channel of field-effect transistors (FET´s) over their full range of operation. The analysis is well suited to the typical FET geometry. The technique is illustrated here by a comparative study of GaAs depletion-mode FET devices.
Keywords :
Conductivity; Epitaxial layers; Etching; FETs; Fabrication; Gallium arsenide; MESFETs; Magnetoresistance; Sea measurements; Substrates;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1980.20265