DocumentCode :
1071779
Title :
Permittivity characterization of low-k thin films from transmission-line measurements
Author :
Janezic, Michael D. ; Williams, Dylan F. ; Blaschke, Volker ; Karamcheti, Arun ; Chang, Chi Shih
Author_Institution :
Nat. Inst. of Stand. & Technol., Boulder, CO, USA
Volume :
51
Issue :
1
fYear :
2003
fDate :
1/1/2003 12:00:00 AM
Firstpage :
132
Lastpage :
136
Abstract :
Developed a broad-band technique for measuring the relative permittivity of low-k thin films using microstrip transmission-line measurements. From measurements of the complex microstrip propagation constant and the characteristic impedance, we determined the relative permittivity of thin films incorporated in microstrip lines. We present measurement results to 40 GHz for both an oxide and a bisbenzocyclobutene low-k thin film and show a variability of permittivity of approximately ±5% over the entire frequency range.
Keywords :
dielectric thin films; microstrip lines; microwave measurement; permittivity measurement; 0 to 40 GHz; bisbenzocyclobutene; characteristic impedance; complex microstrip propagation constant; low-k thin films; microstrip transmission-line measurements; permittivity characterization; relative permittivity; Conductive films; Dielectric measurements; Dielectric thin films; Frequency measurement; Microstrip; Permittivity measurement; Propagation constant; Transistors; Transmission line measurements; Transmission lines;
fLanguage :
English
Journal_Title :
Microwave Theory and Techniques, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9480
Type :
jour
DOI :
10.1109/TMTT.2002.806925
Filename :
1159675
Link To Document :
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