DocumentCode
1072024
Title
A quantitative model of the effect of grain size on the resistivity of polycrystalline silicon resistors
Author
Lu, N.C.C. ; Gerzberg, L. ; Meindl, J.D.
Author_Institution
Stanford University, Stanford, California
Volume
1
Issue
3
fYear
1980
fDate
3/1/1980 12:00:00 AM
Firstpage
38
Lastpage
41
Abstract
The effect of grain size on the resistivity of polycrystalline silicon films has been investigated theoretically and experimentally. It is shown that existing models do not accurately predict the resistivity dependence on doping concentration as grain size increases. A new modified trapping theory demonstrates from a good agreement with experimental results that a significant increase in grain size drastically reduces the sensitivity of polysilicon resistivity to doping concentration.
Keywords
Annealing; Boron; Conductivity; Doping; Electrical resistance measurement; Grain size; Resistors; Semiconductor process modeling; Silicon; Size measurement;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1980.25222
Filename
1481084
Link To Document