• DocumentCode
    1072024
  • Title

    A quantitative model of the effect of grain size on the resistivity of polycrystalline silicon resistors

  • Author

    Lu, N.C.C. ; Gerzberg, L. ; Meindl, J.D.

  • Author_Institution
    Stanford University, Stanford, California
  • Volume
    1
  • Issue
    3
  • fYear
    1980
  • fDate
    3/1/1980 12:00:00 AM
  • Firstpage
    38
  • Lastpage
    41
  • Abstract
    The effect of grain size on the resistivity of polycrystalline silicon films has been investigated theoretically and experimentally. It is shown that existing models do not accurately predict the resistivity dependence on doping concentration as grain size increases. A new modified trapping theory demonstrates from a good agreement with experimental results that a significant increase in grain size drastically reduces the sensitivity of polysilicon resistivity to doping concentration.
  • Keywords
    Annealing; Boron; Conductivity; Doping; Electrical resistance measurement; Grain size; Resistors; Semiconductor process modeling; Silicon; Size measurement;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1980.25222
  • Filename
    1481084