Title :
Laser coupling: A new technique for measurement of refractive index and thickness of oxide and nitride films on silicon
Author :
Schinke, D. ; Smith, Ross ; MacKenzie, D.
Author_Institution :
Bell Telephone Lab., Inc., Murray Hill, NJ, USA
fDate :
9/1/1977 12:00:00 AM
Keywords :
Drilling; Gas lasers; Optical coupling; Optical films; Power lasers; Reflectivity; Refractive index; Semiconductor films; Silicon; Thickness measurement;
Journal_Title :
Quantum Electronics, IEEE Journal of
DOI :
10.1109/JQE.1977.1069622
