Title :
One-step repair of transparent defects in hard-surface photolithographic masks via laser photodeposition
Author :
Ehrlich, D.J. ; Osgood, R.M., Jr. ; Silversmith, D.J. ; Deutsch, T.F.
Author_Institution :
Massachusetts Institute of Technology, Lexington, Massachusetts
fDate :
6/1/1980 12:00:00 AM
Abstract :
A technique for simple, one-step correction of transparent defects in hard-surface, photolithographic masks is demonstrated. The correction process uses laser photodetection of a metal film from a metal-alkyl parent gas.
Keywords :
Gas lasers; Helium; Laser beams; Lenses; Lithography; Metallization; Microscopy; Pulsed laser deposition; Substrates; Surface contamination;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/EDL.1980.25246
