Corrections to "Limitations on single beam production lithography"

Author

Levi, M.W.

Author_Institution

Rome Air Development Center, Griffiss, NY

Volume

Issue

fYear

1980

Firstpage

244

Lastpage

244

Abstract

On page 196, column 1 line 9 of the above-named work (ibid., Vol. EDL-1, No. 6, pp 194-196, October, 1980) "overhauling" should be "overvaluing."

Keywords

Electrons; Image resolution; Lithography; Physics; Production; Resists;

fLanguage

English

Journal_Title

Electron Device Letters, IEEE

Publisher

ieee

ISSN

0741-3106

Type

DOI

10.1109/EDL.1980.25304

Filename

1481166

Link To Document