Title :
Corrections to "Limitations on single beam production lithography"
Author_Institution :
Rome Air Development Center, Griffiss, NY
Abstract :
On page 196, column 1 line 9 of the above-named work (ibid., Vol. EDL-1, No. 6, pp 194-196, October, 1980) "overhauling" should be "overvaluing."
Keywords :
Electrons; Image resolution; Lithography; Physics; Production; Resists;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/EDL.1980.25304
