Title :
Corrections to "A high resolution negative electron resist by image reversal"
Author :
Oldham, W.G. ; Hieke, E.
Author_Institution :
Siemens AG, Research Laboratories, Munich, Germany
Abstract :
A corrected figure 3 is presented for the above-named work (ibid., Vol. EDL-I, No. 10, October 1980).
Keywords :
Electrons; Image resolution; Resists;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/EDL.1980.25305
