DocumentCode :
1073230
Title :
Growth of high-purity semi-insulating bulk GaAs for integrated-circuit applications
Author :
Fairman, Robert D. ; Ch´en, Daniel R. ; Oliver, John R. ; Ch´en, D.R.
Author_Institution :
Rockwell International, Thousand Oaks, CA
Volume :
28
Issue :
2
fYear :
1981
fDate :
2/1/1981 12:00:00 AM
Firstpage :
135
Lastpage :
140
Abstract :
Growth of high-purity bulk semi-insulating GaAs by the Liquid-Encapsulated Czochralski (LEC) method has produced thermally stable, high-resistivity crystals suitable for use in direct ion implantation. Large round substrates have become available for integrated-circuit processing. The implanted wafers have excellent electrical uniformity (±4 percent Vp) and have shown electron mobility as high as 4800cm2/V.s for Se implants with 1.7 × 1017cm-3peak doping. Careful control of background doping through in situ synthesis has produced GaAs with Si concentrations as low as 6 × 1014cm-3grown from SiO2crucibles. Detailed results of qualification tests for ion implantation in LEC GaAs will be discussed. Feasibility of successful high-speed GaAs large-scale integrated circuits using LEC substrates will be described.
Keywords :
Circuit testing; Crystals; Doping; Electron mobility; Gallium arsenide; High speed integrated circuits; Implants; Ion implantation; Large scale integration; Qualifications;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1981.20299
Filename :
1481451
Link To Document :
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