Multi-SWD Plasma Jet System for PECVD Deposition of Thin Films

Author

Olejnicek, Jiri ; Cada, Michael ; Smid, Jakub ; Kment, Stepan ; Hubicka, Zdenek

Author_Institution

Dept. of Low-Temp. Plasma, Inst. of Phys., Prague, Czech Republic

Volume

42

Issue

10

fYear

2014

fDate

Oct. 2014

Firstpage

2502

Lastpage

2503

Abstract

Multiplasma jet surface-wave discharge launched by the surfatron is a promising PECVD tool for scalable deposition of various semiconductor materials. The time-resolved Langmuir probe study revealed that the plasma plume is inhomogeneous toward the substrate. In the measured interval, the electron energy and the plasma density increased with distance from the nozzle outlet. These findings allowed us to optimize the substrate position during the deposition process.

Keywords

Langmuir probes; chemical vapour deposition; high-frequency discharges; plasma density; plasma jets; plasma materials processing; surface discharges; thin films; PECVD deposition; deposition process; electron energy; multiSWD plasma jet system; multiplasma jet surface-wave discharge; plasma density; plasma plume; semiconductor materials; thin films; time-resolved Langmuir probe; Argon; Discharges (electric); Electron tubes; Plasmas; Substrates; Surface discharges; Surface waves; Nuclear and plasma sciences; Plasma applications; Plasma devices; Plasmas; Plasmas.;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/TPS.2014.2314214

Filename

6810866