DocumentCode
1073529
Title
Real space transfer noise in buried-channel devices
Author
Tang, Jeff Y. ; Hess, Karl
Author_Institution
University of Illinois at Urbana-Champaign, Urbana, IL
Volume
28
Issue
3
fYear
1981
fDate
3/1/1981 12:00:00 AM
Firstpage
285
Lastpage
289
Abstract
The noise due to the spilling of hot electrons out of potential wells and subsequent trapping is calculated. This noise is the real space analogy to the intervalley noise in transfer devices. Our results show that this noise can be important for heterojunction FET´s and MOS devices. The Thornber formalism used in our calculation is general and applies for nonstationary cases. Results are given only for the specific case of buried-channel charge-coupled devices because for other devices this type of noise can be derived as a special case.
Keywords
Charge carrier processes; Electron emission; Electron mobility; Electron traps; Heterojunctions; Interface states; MOS devices; Potential well; Semiconductor device noise; Temperature;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1981.20329
Filename
1481481
Link To Document