DocumentCode :
1073584
Title :
A new method for the two-dimensional calculation of the potential distribution in a buried-channel charge-coupled device: Theory and experimental verification
Author :
De Meyer, Kristin M. ; Declerck, Gilbert J.
Author_Institution :
IBM Thomas J. Watson Research Center, Yorktown Heights, NY
Volume :
28
Issue :
3
fYear :
1981
fDate :
3/1/1981 12:00:00 AM
Firstpage :
313
Lastpage :
321
Abstract :
This paper describes a new method for calculating the potential distribution in the depleted top layer and in the substrate of a buried-channel charge-coupled (BCCD) device. The depletion approximation is used. The experimental verification of the method is done by comparing the results with measured values for the maximum channel potential ΦMAX, the location Ymof that maximum, and the location H of the edge of the p-n depletion layer into the substrate.
Keywords :
Boundary conditions; Charge coupled devices; Dielectric substrates; Differential equations; Doping profiles; Finite difference methods; Insulation; Poisson equations;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1981.20334
Filename :
1481486
Link To Document :
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