DocumentCode
1073584
Title
A new method for the two-dimensional calculation of the potential distribution in a buried-channel charge-coupled device: Theory and experimental verification
Author
De Meyer, Kristin M. ; Declerck, Gilbert J.
Author_Institution
IBM Thomas J. Watson Research Center, Yorktown Heights, NY
Volume
28
Issue
3
fYear
1981
fDate
3/1/1981 12:00:00 AM
Firstpage
313
Lastpage
321
Abstract
This paper describes a new method for calculating the potential distribution in the depleted top layer and in the substrate of a buried-channel charge-coupled (BCCD) device. The depletion approximation is used. The experimental verification of the method is done by comparing the results with measured values for the maximum channel potential ΦMAX , the location Ym of that maximum, and the location
of the edge of the p-n depletion layer into the substrate.
of the edge of the p-n depletion layer into the substrate.Keywords
Boundary conditions; Charge coupled devices; Dielectric substrates; Differential equations; Doping profiles; Finite difference methods; Insulation; Poisson equations;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1981.20334
Filename
1481486
Link To Document