DocumentCode :
1073943
Title :
Virtual phase technology: A new approach to fabrication of large-area CCD´s
Author :
Hynecek, Jaroslav
Author_Institution :
Texas Instruments Incorporated, Dallas, TX
Volume :
28
Issue :
5
fYear :
1981
fDate :
5/1/1981 12:00:00 AM
Firstpage :
483
Lastpage :
489
Abstract :
This article presents a new technology for fabrication of a single-phase CCD. This new technology called virtual phase (VP) employs only a single level gate structure, and is, therefore, ideally suited for fabrication of large-area high-performance devices with high yield, The fundamentals of operation of VP CCD´s are discussed, and the advantages and limitations of this new technology are presented. The design, fabrication, and operation of a 490 × 328 TV compatible VP imager is described, and performance parameters as well as imagery are presented.
Keywords :
Charge coupled devices; Charge transfer; Clocks; Costs; Electrodes; Implants; Optical coupling; Optical device fabrication; Optical sensors; TV;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1981.20370
Filename :
1481522
Link To Document :
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