Title :
Flash chromium interlayer for high performance disks with superior noise and coercivity squareness
Author :
Teng, Edward ; Eltoukhy, Atef
Author_Institution :
Nashua Corp., Santa Clara, CA, USA
fDate :
11/1/1993 12:00:00 AM
Abstract :
A special cathode was designed to sputter flash chrome interlayer (0.5-1.5 nm) between CoCrPt magnetic layers. Disks with such a laminated structure have been manufactured in a high volume in-line sputtering system. They have consistently exhibited excellent PW50, overwrite, and signal to noise ratio (SNR). In addition, the chrome interlayer improved the disk anisotropy with less coercivity variation around the disk. High resolution transmission electron microscopy (TEM) cross section micrograph and X-ray diffraction (XRD) were used to examine film microstructure and crystallographic orientation. A special film growth mechanism is proposed to interpret the magnetic and parametric performance of disks with flash Cr interlayer
Keywords :
X-ray diffraction examination of materials; chromium; chromium alloys; cobalt alloys; coercive force; crystal microstructure; crystal orientation; magnetic anisotropy; magnetic disc storage; magnetic multilayers; magnetic recording; magnetic thin film devices; noise; platinum alloys; sputter deposition; tantalum alloys; transmission electron microscope examination of materials; 0.5 to 1.5 nm; CoCrPt-Cr-CoCrPt; CoCrPtTa-Cr-CoCrPt; PW50; SNR; X-ray diffraction; cathode; coercivity squareness; cross section micrograph; crystal microstructure; crystallographic orientation; disk anisotropy; film growth mechanism; film microstructure; flash chrome interlayer; high resolution TEM; in-line sputtering system; laminated structure; magnetic performance; magnetic recording; multilayer thin film disc; overwrite; parametric performance; signal to noise ratio; transmission electron microscopy; Anisotropic magnetoresistance; Cathodes; Chromium; Coercive force; Magnetic anisotropy; Magnetic films; Manufacturing; Perpendicular magnetic anisotropy; Signal to noise ratio; Sputtering;
Journal_Title :
Magnetics, IEEE Transactions on
