DocumentCode
1074518
Title
Arc Stability of Electronegative Gases
Author
Manion, J.P. ; Philosophos, J.A. ; Robinson, M.B.
Author_Institution
Allis-Chalmers Manufacturing Company, Milwaukee, Wisc
Issue
1
fYear
1967
fDate
4/1/1967 12:00:00 AM
Firstpage
1
Lastpage
10
Abstract
The decomposition of electronegative gases in electric discharges was studied to determine relative chemical stabilities and the effect of the discharge on dielectric strength. Rate of disappearance of the parent molecule and variation in dielectric strength with arcing time were determined. Good correlation was noted between atomic composition, molecular complexity and stability of the gases to discharge. In the fluorocarbon series the partial substitution of chlorine for fluorine or an increase in molecular complexity by the introduction of the carbon-carbon bond resulted in decreased discharge stability. The major gaseous product of all fluoro-and chlorofluorcarbons studied was CF4; which was itself almost unaffected by the discharge. A group of molecules of relatively simple structure was found to possess a unique degree of discharge stability.
Keywords
Chemicals; Corona; Dielectric breakdown; Dielectric materials; Dielectrics and electrical insulation; Gases; Glass; Mass spectroscopy; Stability; Sulfur hexafluoride;
fLanguage
English
Journal_Title
Electrical Insulation, IEEE Transactions on
Publisher
ieee
ISSN
0018-9367
Type
jour
DOI
10.1109/TEI.1967.298843
Filename
4081307
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