• DocumentCode
    1074518
  • Title

    Arc Stability of Electronegative Gases

  • Author

    Manion, J.P. ; Philosophos, J.A. ; Robinson, M.B.

  • Author_Institution
    Allis-Chalmers Manufacturing Company, Milwaukee, Wisc
  • Issue
    1
  • fYear
    1967
  • fDate
    4/1/1967 12:00:00 AM
  • Firstpage
    1
  • Lastpage
    10
  • Abstract
    The decomposition of electronegative gases in electric discharges was studied to determine relative chemical stabilities and the effect of the discharge on dielectric strength. Rate of disappearance of the parent molecule and variation in dielectric strength with arcing time were determined. Good correlation was noted between atomic composition, molecular complexity and stability of the gases to discharge. In the fluorocarbon series the partial substitution of chlorine for fluorine or an increase in molecular complexity by the introduction of the carbon-carbon bond resulted in decreased discharge stability. The major gaseous product of all fluoro-and chlorofluorcarbons studied was CF4; which was itself almost unaffected by the discharge. A group of molecules of relatively simple structure was found to possess a unique degree of discharge stability.
  • Keywords
    Chemicals; Corona; Dielectric breakdown; Dielectric materials; Dielectrics and electrical insulation; Gases; Glass; Mass spectroscopy; Stability; Sulfur hexafluoride;
  • fLanguage
    English
  • Journal_Title
    Electrical Insulation, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9367
  • Type

    jour

  • DOI
    10.1109/TEI.1967.298843
  • Filename
    4081307