Title :
Arc Stability of Electronegative Gases
Author :
Manion, J.P. ; Philosophos, J.A. ; Robinson, M.B.
Author_Institution :
Allis-Chalmers Manufacturing Company, Milwaukee, Wisc
fDate :
4/1/1967 12:00:00 AM
Abstract :
The decomposition of electronegative gases in electric discharges was studied to determine relative chemical stabilities and the effect of the discharge on dielectric strength. Rate of disappearance of the parent molecule and variation in dielectric strength with arcing time were determined. Good correlation was noted between atomic composition, molecular complexity and stability of the gases to discharge. In the fluorocarbon series the partial substitution of chlorine for fluorine or an increase in molecular complexity by the introduction of the carbon-carbon bond resulted in decreased discharge stability. The major gaseous product of all fluoro-and chlorofluorcarbons studied was CF4; which was itself almost unaffected by the discharge. A group of molecules of relatively simple structure was found to possess a unique degree of discharge stability.
Keywords :
Chemicals; Corona; Dielectric breakdown; Dielectric materials; Dielectrics and electrical insulation; Gases; Glass; Mass spectroscopy; Stability; Sulfur hexafluoride;
Journal_Title :
Electrical Insulation, IEEE Transactions on
DOI :
10.1109/TEI.1967.298843