DocumentCode :
1074587
Title :
Magnetic microactuation of polysilicon flexure structures
Author :
Judy, Jack W. ; Muller, Richard S. ; Zappe, Hans H.
Author_Institution :
Sensor & Actuator Center, California Univ., Berkeley, CA, USA
Volume :
4
Issue :
4
fYear :
1995
fDate :
12/1/1995 12:00:00 AM
Firstpage :
162
Lastpage :
169
Abstract :
A microactuator technology that combines magnetic thin films with polysilicon flexural structures is described. Devices are constructed in a batch-fabrication process that combines electroplating with conventional lithography, materials, and equipment. A microactuator consisting of a 400×(47-40)×7 μm3 rectangular plate of NiFe attached to a 400×(0.9-1.4)×2.25 μm3 polysilicon cantilever beam has been displaced over 1.2 mm, rotated over 180°, and actuated with over 0.185 nNm of torque. The microactuator is capable of motion both in and out of the wafer plane and has been operated in a conductive fluid environment. Theoretical expressions for the displacement and torque are developed and compared to experimental results
Keywords :
electroplating; elemental semiconductors; ferromagnetic materials; iron alloys; lithography; magnetic thin film devices; microactuators; nickel alloys; silicon; 1.2 mm; NiFe-Si; batch-fabrication process; cantilever beam; conductive fluid environment; displacement; electroplating; lithography; magnetic microactuation; magnetic thin films; microactuator technology; polysilicon flexure structures; rectangular plate; torque; Actuators; Fabrication; Magnetic fields; Magnetic materials; Magnetic sensors; Microactuators; Micromagnetics; Micromechanical devices; Saturation magnetization; Torque;
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/84.475542
Filename :
475542
Link To Document :
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