DocumentCode :
1074945
Title :
Subthreshold kinks in fully depleted SOI MOSFET´s
Author :
Fossum, J.G. ; Krishnan, S. ; Faynot, O. ; Cristoloveanu, V. ; Raynaud, C.
Author_Institution :
Dept. of Electr. & Comput. Eng., Florida Univ., Gainesville, FL, USA
Volume :
16
Issue :
12
fYear :
1995
Firstpage :
542
Lastpage :
544
Abstract :
Measured current-voltage characteristics of scaled, floating-body, fully depleted (FD) SOI MOSFET´s that show subthreshold kinks controlled by the back-gate (substrate) bias are presented. The underlying physical mechanism is described, and is distinguished from the well known kink effect in partially depleted devices. The physical insight attained qualifies the meaning of FD/SOI and implies new design issues for low-voltage FD/SOI CMOS.
Keywords :
MOSFET; silicon-on-insulator; current-voltage characteristics; floating body; fully depleted SOI MOSFETs; low-voltage FD/SOI CMOS; substrate bias; subthreshold kinks; Bipolar transistors; Breakdown voltage; Current measurement; Current-voltage characteristics; Electric breakdown; Electrons; FETs; MOSFET circuits; Solids; Virtual manufacturing;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.475581
Filename :
475581
Link To Document :
بازگشت