• DocumentCode
    1074945
  • Title

    Subthreshold kinks in fully depleted SOI MOSFET´s

  • Author

    Fossum, J.G. ; Krishnan, S. ; Faynot, O. ; Cristoloveanu, V. ; Raynaud, C.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Florida Univ., Gainesville, FL, USA
  • Volume
    16
  • Issue
    12
  • fYear
    1995
  • Firstpage
    542
  • Lastpage
    544
  • Abstract
    Measured current-voltage characteristics of scaled, floating-body, fully depleted (FD) SOI MOSFET´s that show subthreshold kinks controlled by the back-gate (substrate) bias are presented. The underlying physical mechanism is described, and is distinguished from the well known kink effect in partially depleted devices. The physical insight attained qualifies the meaning of FD/SOI and implies new design issues for low-voltage FD/SOI CMOS.
  • Keywords
    MOSFET; silicon-on-insulator; current-voltage characteristics; floating body; fully depleted SOI MOSFETs; low-voltage FD/SOI CMOS; substrate bias; subthreshold kinks; Bipolar transistors; Breakdown voltage; Current measurement; Current-voltage characteristics; Electric breakdown; Electrons; FETs; MOSFET circuits; Solids; Virtual manufacturing;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.475581
  • Filename
    475581