DocumentCode :
1075099
Title :
Influence of insulators on R/W process in laminated film heads
Author :
Kobayashi, Hiroshi ; Ura, Masashi ; Ozeki, Tatsuo
Author_Institution :
Mitsubishi Electric Corp., Hyogo, Japan
Volume :
29
Issue :
6
fYear :
1993
fDate :
11/1/1993 12:00:00 AM
Firstpage :
3846
Lastpage :
3848
Abstract :
The influence of insulators on read/write (R/W) process in laminated film heads was investigated by the Bitter method and computer simulations. Some unrecorded areas exist in a recording track, and the areas correspond to the position of insulators at the trailing side. The effective recording width depends on not only the recording current but also the relative positions of insulators at the leading and trailing edges. These results were confirmed by the simulation. In the reproducing process, the loss caused by the insulator is smaller than the ratio of the track width by the insulator´s thickness. In both R/W characteristics, the laminated film head with inline insulators at both sides of the gap is superior to that with the staggered insulators
Keywords :
digital simulation; finite element analysis; laminates; magnetic heads; magnetic multilayers; magnetic recording; magnetic thin film devices; video recording; 3D FEM; Bitter method; R/W process; SiO2; computer simulations; digital VCR; insulator influence; laminated film heads; multilayer head; numerical analysis; read/write characteristics; recording current; recording width; reproducing process; sendust magnetic film; Computer simulation; Dielectrics and electrical insulation; Frequency; Insulation life; Magnetic films; Magnetic heads; Magnetic multilayers; Magnetic recording; Saturation magnetization; Video recording;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.281318
Filename :
281318
Link To Document :
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