DocumentCode :
1075318
Title :
Negative ion production rates in rare gas-halide lasers
Author :
Nygaard, Kaare J. ; Brooks, Howard L. ; Hunter, Scott R.
Author_Institution :
University of Missouri-Rolla, Rolla, MO, USA
Volume :
15
Issue :
11
fYear :
1979
fDate :
11/1/1979 12:00:00 AM
Firstpage :
1216
Lastpage :
1223
Abstract :
This paper reports on dissociative electron attachment in F2, NF3, Cl2, and I2. The principle of the method is to produce a short burst of photoelectrons from a photocathode by means of light from an argon-fluoride laser. Subsequently, by studying the motion of electrons and negative ions in a constant electric field ( E ) region, information is obtained about drift velocities and effective attachment cross sections. Helium, argon, and nitrogen were used as buffer gases. Of particular interest is a very strong temperature dependence of the attachment coefficient in I2. Measurements were taken from 35 to 110°C, covering an E/N range of 1-50 Townsend. An explanation based on vibrational excitation is presented.
Keywords :
Noble-gas lasers; Argon; Cathodes; Electron mobility; Gas lasers; Gases; Helium; Nitrogen; Noise measurement; Production; Temperature dependence;
fLanguage :
English
Journal_Title :
Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9197
Type :
jour
DOI :
10.1109/JQE.1979.1069918
Filename :
1069918
Link To Document :
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