Title :
Photonic bandpass filters with high skirt selectivity and stopband attenuation
Author :
Chan, Erwin H W ; Alameh, Kamal E. ; Minasian, Robert A.
Author_Institution :
Sch. of Electr. & Inf. Eng., Univ. of Sydney, NSW, Australia
fDate :
11/1/2002 12:00:00 AM
Abstract :
A new photonic signal processor topology that simultaneously achieves both a high-Q and a high skirt selectivity and stopband attenuation filter response is presented. It is based on a novel dual-cavity bandpass optical structure in which two pairs of active fiber Bragg grating cavities are used with an optical gain offset to control the poles and stopband attenuation characteristics of the filter. This concept enables a large improvement in the filter stopband attenuation, rejection bandwidth, and skirt selectivity to be realized. Measured results demonstrate both a narrow bandpass bandwidth of 0.4% of center frequency and a skirt selectivity factor of 16.6 for 40 dB rejection, which corresponds to a 6.5-fold improvement in comparison to conventional single cavity high-Q structures. To our knowledge, this is the best skirt selectivity reported for a photonic bandpass filter to date. The new photonic filter structure has been experimentally verified and excellent agreement between measured and predicted responses is shown.
Keywords :
Bragg gratings; Q-factor; band-pass filters; optical design techniques; optical fibre filters; optical resonators; active fiber Bragg grating cavities; center frequency; dual-cavity bandpass optical structure; filter stopband attenuation; high skirt selectivity; high-Q selectivity; high-Q structures; narrow bandpass bandwidth; optical gain offset; photonic bandpass filter; photonic bandpass filters; photonic signal processor topology; rejection bandwidth; stopband attenuation; stopband attenuation characteristics; stopband attenuation filter response; Attenuation; Band pass filters; Bandwidth; Frequency measurement; Optical attenuators; Optical control; Optical fiber filters; Optical filters; Signal processing; Topology;
Journal_Title :
Lightwave Technology, Journal of
DOI :
10.1109/JLT.2002.804018