DocumentCode :
1075552
Title :
Study of Stress and Morphology of Superconducting Niobium Thin Films
Author :
Liu, Jianshe ; Li, Jinyang ; Li, Tianzong ; Li, Tiefu ; Wu, Wei ; Chen, Wei
Author_Institution :
Dept. of Micro/Nanoelectron., Tsinghua Univ., Beijing, China
Volume :
19
Issue :
3
fYear :
2009
fDate :
6/1/2009 12:00:00 AM
Firstpage :
245
Lastpage :
248
Abstract :
Intrinsic stress, surface morphology and crystallographic structure of superconducting thin films play an important role in determining the quality of their superconducting properties and the Josephson junctions made of them. Nb thin films deposited by DC magnetron sputtering with various deposition conditions were studied using curvature method, atomic force microscopy and X-ray diffraction. The role of sputtering pressure, gun operating parameters, substrate temperature and substrate materials on film morphology, crystallographic structure and intrinsic stress are investigated. Superconducting transition temperatures of the films were measured and relationship between the transition temperatures and deposition conditions were studied.
Keywords :
Josephson effect; X-ray diffraction; atomic force microscopy; crystal structure; niobium; sputter deposition; stress effects; superconducting materials; superconducting thin films; superconducting transition temperature; surface morphology; DC magnetron sputtering; Josephson junction; Nb; X-ray diffraction; atomic force microscopy; crystallographic structure; curvature method; intrinsic stress; sputtering pressure; superconducting niobium thin film; superconducting transition temperature; surface morphology; Morphology; Nb; stress; thin film;
fLanguage :
English
Journal_Title :
Applied Superconductivity, IEEE Transactions on
Publisher :
ieee
ISSN :
1051-8223
Type :
jour
DOI :
10.1109/TASC.2009.2019233
Filename :
5075612
Link To Document :
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