Title :
Preparation and properties of Ga1-xAlxAs-GaAs heterostructure lasers grown by metalorganic chemical vapor deposition
Author :
Dupuis, Russell D. ; Dapkus, P.Daniel
Author_Institution :
Rockwell International, Anaheim, CA, USA
fDate :
3/1/1979 12:00:00 AM
Abstract :
Recently Ga1-xAlxAs-GaAs double-heterostructure lasers having low threshold current densities have been grown by metalorganic chemical vapor deposition. In addition to these conventional double-heterostructure lasers, unique laser structures have been grown, e.g., channel-guide, distributed-Bragg-confinement, and single- and multiple-quantum-well lasers. We describe here the preparation and performance of these devices.
Keywords :
Gallium materials/lasers; Semiconductor growth; Aluminum alloys; Chemical lasers; Chemical vapor deposition; DH-HEMTs; Doping; Epitaxial layers; Heterojunctions; Hydrogen; Threshold current; Transistors;
Journal_Title :
Quantum Electronics, IEEE Journal of
DOI :
10.1109/JQE.1979.1069974