DocumentCode :
1075936
Title :
Preparation and properties of Ga1-xAlxAs-GaAs heterostructure lasers grown by metalorganic chemical vapor deposition
Author :
Dupuis, Russell D. ; Dapkus, P.Daniel
Author_Institution :
Rockwell International, Anaheim, CA, USA
Volume :
15
Issue :
3
fYear :
1979
fDate :
3/1/1979 12:00:00 AM
Firstpage :
128
Lastpage :
135
Abstract :
Recently Ga1-xAlxAs-GaAs double-heterostructure lasers having low threshold current densities have been grown by metalorganic chemical vapor deposition. In addition to these conventional double-heterostructure lasers, unique laser structures have been grown, e.g., channel-guide, distributed-Bragg-confinement, and single- and multiple-quantum-well lasers. We describe here the preparation and performance of these devices.
Keywords :
Gallium materials/lasers; Semiconductor growth; Aluminum alloys; Chemical lasers; Chemical vapor deposition; DH-HEMTs; Doping; Epitaxial layers; Heterojunctions; Hydrogen; Threshold current; Transistors;
fLanguage :
English
Journal_Title :
Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9197
Type :
jour
DOI :
10.1109/JQE.1979.1069974
Filename :
1069974
Link To Document :
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