Title :
VIA-2 rapid direct writing of surface relief structures in silicon using laser photoetching
Author :
Ehrlich, D.J. ; Osgood, R.M. ; Deutsch, T.F.
fDate :
10/1/1981 12:00:00 AM
Keywords :
Annealing; Chemical lasers; Conductive films; Etching; Gas lasers; Optical pulses; Semiconductor films; Silicon; Surface emitting lasers; Writing;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1981.20581