DocumentCode
1076177
Title
VIA-3 characteristics of pulsed laser annealed two micron channel length N-channel SOS transistor
Author
Chi, Yu Mike ; Gupta, Arpan ; Olson, G. ; Hess, L.D.
Volume
28
Issue
10
fYear
1981
fDate
10/1/1981 12:00:00 AM
Firstpage
1254
Lastpage
1255
Keywords
Annealing; CMOS technology; Electron mobility; Laboratories; Leakage current; MOSFETs; Optical device fabrication; Optical pulses; Semiconductor films; Silicon;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1981.20583
Filename
1481735
Link To Document