• DocumentCode
    1076177
  • Title

    VIA-3 characteristics of pulsed laser annealed two micron channel length N-channel SOS transistor

  • Author

    Chi, Yu Mike ; Gupta, Arpan ; Olson, G. ; Hess, L.D.

  • Volume
    28
  • Issue
    10
  • fYear
    1981
  • fDate
    10/1/1981 12:00:00 AM
  • Firstpage
    1254
  • Lastpage
    1255
  • Keywords
    Annealing; CMOS technology; Electron mobility; Laboratories; Leakage current; MOSFETs; Optical device fabrication; Optical pulses; Semiconductor films; Silicon;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1981.20583
  • Filename
    1481735