DocumentCode :
1076345
Title :
Electrical characteristics of an E-beam controlled KrF*discharge
Author :
Long, William H., Jr. ; Bradford, Robert S., Jr.
Author_Institution :
Northrop Research and Technology Center, Palos Verdes Peninsula, CA, USA
Volume :
15
Issue :
5
fYear :
1979
fDate :
5/1/1979 12:00:00 AM
Firstpage :
327
Lastpage :
331
Abstract :
Plasma electrical characteristics have been measured as a function of 
-beam current density (JB ) and fluorine concentration for Ar, Kr, and F2 gas mixtures in order to identify the stable operating regime of KrF* laser interest. The data were obtained from a 120 cm3active volume -beam controlled discharge laser. The optimum F2 concentration was found to be 0.17 percent at JB = 17.9 A/cm2. This mixture also gave the best laser extraction efficiency and consequently produced the highest laser output energy. The dissociative electron attachment rate constant in the laser mixture was determined from the discharge voltage and current measurements.
-beam current density (J -beam controlled discharge laser. The optimum FKeywords :
Noble-gas lasers; Plasmas; Ultraviolet lasers; Current density; Current measurement; Density measurement; Electric variables; Electric variables measurement; Gas lasers; Plasma density; Plasma measurements; Plasma properties; Plasma stability;
fLanguage :
English
Journal_Title :
Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9197
Type :
jour
DOI :
10.1109/JQE.1979.1070008
Filename :
1070008
Link To Document :
