DocumentCode
1076413
Title
Efficient E-beam excitation of XeCl
Author
Rothe, Dietmar E. ; West, John B. ; Bhaumik, Mani L.
Author_Institution
Northrop Research and Technology Center, Palos Verdes Peninsula, CA, USA
Volume
15
Issue
5
fYear
1979
fDate
5/1/1979 12:00:00 AM
Firstpage
314
Lastpage
317
Abstract
Efficient laser output at 308 nm has been obtained from XeCl in an Ne/Xe/HCl mixture at a pressure of 4 atm by 
-beam excitation and by -beam controlled discharge pumping. Maximum energy extraction is 7 J/1 for -beam excitation and 9 J/1 for the -beam controlled discharge. Efficiencies based on total energy deposited in the gas are approximately 4 percent. Similar results were obtained with KrF in the same device, indicating that under -beam or -beam controlled discharge excitation, XeCl may be as efficient as KrF.
-beam excitation and by -beam controlled discharge pumping. Maximum energy extraction is 7 J/1 for -beam excitation and 9 J/1 for the -beam controlled discharge. Efficiencies based on total energy deposited in the gas are approximately 4 percent. Similar results were obtained with KrF in the same device, indicating that under -beam or -beam controlled discharge excitation, XeCl may be as efficient as KrF.Keywords
Noble-gas lasers; Pulsed lasers; Ultraviolet lasers; Absorption; Argon; Fault location; Gas lasers; Helium; Laser excitation; Power lasers; Pump lasers; Raman scattering; Xenon;
fLanguage
English
Journal_Title
Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
0018-9197
Type
jour
DOI
10.1109/JQE.1979.1070015
Filename
1070015
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