DocumentCode :
1076413
Title :
Efficient E-beam excitation of XeCl
Author :
Rothe, Dietmar E. ; West, John B. ; Bhaumik, Mani L.
Author_Institution :
Northrop Research and Technology Center, Palos Verdes Peninsula, CA, USA
Volume :
15
Issue :
5
fYear :
1979
fDate :
5/1/1979 12:00:00 AM
Firstpage :
314
Lastpage :
317
Abstract :
Efficient laser output at 308 nm has been obtained from XeCl in an Ne/Xe/HCl mixture at a pressure of 4 atm by 
-beam excitation and by -beam controlled discharge pumping. Maximum energy extraction is 7 J/1 for -beam excitation and 9 J/1 for the -beam controlled discharge. Efficiencies based on total energy deposited in the gas are approximately 4 percent. Similar results were obtained with KrF in the same device, indicating that under -beam or -beam controlled discharge excitation, XeCl may be as efficient as KrF.
-beam excitation and by -beam controlled discharge pumping. Maximum energy extraction is 7 J/1 for -beam excitation and 9 J/1 for the -beam controlled discharge. Efficiencies based on total energy deposited in the gas are approximately 4 percent. Similar results were obtained with KrF in the same device, indicating that under -beam or -beam controlled discharge excitation, XeCl may be as efficient as KrF.Keywords :
Noble-gas lasers; Pulsed lasers; Ultraviolet lasers; Absorption; Argon; Fault location; Gas lasers; Helium; Laser excitation; Power lasers; Pump lasers; Raman scattering; Xenon;
fLanguage :
English
Journal_Title :
Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9197
Type :
jour
DOI :
10.1109/JQE.1979.1070015
Filename :
1070015
Link To Document :
