DocumentCode :
1076448
Title :
2-kHz repetition rate XeF laser
Author :
Wang, Charles P. ; Gibb, Owen L.
Author_Institution :
The Aerospace Corporation, Los Angeles, CA, USA
Volume :
15
Issue :
5
fYear :
1979
fDate :
5/1/1979 12:00:00 AM
Firstpage :
318
Lastpage :
321
Abstract :
High-repetition-rate laser action, up to 2 kHz, has been demonstrated in XeF molecules at 351 and 353 nm by using a blowdown fast transverse-flow system and a four-circuit, thyratron-switched, low inductance pulse generator. For a typical run, the transverse flow was uniform, and the average flow velocity was 25 m/s across a discharge region of 1.4 \\times 0.4 \\times 30 cm3. The gas mixture used was He:Xe:NF3= 100:1.5:0.5, and the total pressure was varied from 600-1200 torr. For single-pulse operation, the maximum laser output energy was 22 mJ/pulse, and the electric efficiency was 0.4 percent. For a 2-kHz repetition rate, the average laser output energy was approximately 12 mJ/pulse with 50 percent variations. Hence, an average output power of 24 W was obtained.
Keywords :
Noble-gas lasers; Pulsed lasers; Ultraviolet lasers; Electrodes; Gas lasers; Inductance; Laser excitation; Optical pulse generation; Optical pulses; Power generation; Power lasers; Pulse generation; Pump lasers;
fLanguage :
English
Journal_Title :
Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9197
Type :
jour
DOI :
10.1109/JQE.1979.1070019
Filename :
1070019
Link To Document :
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