DocumentCode :
1076867
Title :
Read-cycle endurance of magnetic random access memory elements
Author :
Kuroiwa, Takeharu ; Takenaga, Takashi ; Sadeh, Beysen ; Kobayashi, Hiroshi ; Sato, Kazunao
Author_Institution :
Adv. Technol. R&D Center, Mitsubishi Electr. Corp., Hyogo, Japan
Volume :
40
Issue :
4
fYear :
2004
fDate :
7/1/2004 12:00:00 AM
Firstpage :
2631
Lastpage :
2633
Abstract :
The read-cycle endurance of a magnetic tunneling junction (MTJ) has been investigated, focusing on the spin-dependent tunneling current at high temperatures. The MTJ structure used in this study consisted of Ta-NiFe-CoFe-AlOx-CoFe-IrMn-NiFe-Ta prepared on a thermally oxidized Si wafer. Both the tunneling current and tunneling magnetoresistance ratio showed no significant degradation during the 1E9 read-cycle test using unipolar voltage pulses of 0.5 V at room temperature. Temperature dependence of the MTJs resistance calculated from the measured tunneling current has also been examined in a temperature range from room temperature to 175°C. Furthermore, in the case of read-cycle tests for thermally stressed MTJs, the variation of the tunneling current was less than 2% after 1E9 cycles at a stress temperature of 175°C. This indicates that MTJs have sufficient read-cycle endurance under high-temperature operation.
Keywords :
ferromagnetic materials; magnetic storage; magnetic thin film devices; magnetic tunnelling; random-access storage; spin valves; tunnelling magnetoresistance; 0.5 V; 175 C; Si wafer; Ta-NiFe-CoFe-AlO-CoFe-IrMn-NiFe-Ta; magnetic random access memory; magnetic thin-film devices; magnetic tunneling junction; read-cycle endurance; spin-dependent tunneling current; temperature dependence; thermal oxidization; tunneling magnetoresistance ratio; unipolar voltage pulses; Current measurement; Magnetic tunneling; Random access memory; Temperature dependence; Temperature distribution; Testing; Thermal degradation; Thermal stresses; Tunneling magnetoresistance; Voltage; Endurance; MRAM; magnetic random access memory; magnetic thin-film devices; magnetoresistance; tunneling current;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2004.832106
Filename :
1325591
Link To Document :
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