DocumentCode :
107689
Title :
Electrostatic Plasma Lens Focusing of an Intense Electron Beam in an Electron Source With a Vacuum Arc Plasma Cathode
Author :
Gushenets, V.I. ; Goncharov, A.A. ; Dobrovolskiy, Andrey M. ; Dunets, Sergey P. ; Litovko, I.V. ; Oks, E.M. ; Bugaev, A.S.
Author_Institution :
Institute of High Current Electronics, Tomsk, Russia
Volume :
41
Issue :
8
fYear :
2013
fDate :
Aug. 2013
Firstpage :
2171
Lastpage :
2176
Abstract :
In this paper, we present the research results on focusing and transport of an intense (up to 100 A) nonrelativistic (up to 20 kV) pulsed electron beam using an axially symmetric device with a high-current plasma lens configuration. The electron source is based on electron extraction from the plasma of a hollow-anode vacuum arc discharge. The arc is initiated by a dielectric surface flashover. The emission hole is covered with a fine mesh grid. The beam is extracted and accelerated in a diode-type electro-optical system formed between the grid surface and an open anode plasma boundary. The anode plasma is produced in an electron beam transport channel through residual gas ionization by beam electrons and a plasma lens discharge. The plasma lens configuration of crossed electric and magnetic fields provides an attractive means to obtain a stable low-pressure plasma discharge. This geometry allows the compression of the electron beam in diameter from 6 to 1 cm with more than 100- {\\rm A}/{\\rm cm}^{2} beam current density at the collector.
Keywords :
Electron beams; Electron sources; Electrooptic devices; Plasma devices; Plasma sources; Vacuum arcs; Electron beams; electron optics; electron sources; plasma devices; plasma sources; vacuum arc;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2013.2252026
Filename :
6487410
Link To Document :
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