Title :
Recombination enhanced annealing effect in AlGaAs/GaAs remote junction heterostructure lasers
Author :
Kobayashi, Takeshi ; Furukawa, Yoshitaka
Author_Institution :
Musashino Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation, Tokyo, Japan
fDate :
8/1/1979 12:00:00 AM
Abstract :
New structure lasers, the remote junction heterostructure (RJH) lasers, are made to obtain information about slow degradation of AlGaAs/GaAs DH lasers. The RJH laser is characterized by the presence of a thin clad layer between the active layer and the p-n junction. During the LD and LED mode aging process, the RJH lasers showed a marked reduction of threshold current. This reduction was accompanied by increased spontaneous lifetime and pileup of defects at the p-n junction. From these observations, a model was proposed in which point defect generation in the active layer and defect motion toward the p-n junction during the aging are assumed. The rate equation was derived for concentration of the point defect, and the solution of this equation was compared with the experimental results with reasonable agreement. The parameters relating to the slow degradation were determined, and the ultimate life of conventional DH lasers was discussed using these parameters.
Keywords :
Gallium materials/lasers; Semiconductor defects; Semiconductor device reliability; Aging; Annealing; DH-HEMTs; Degradation; Equations; Gallium arsenide; Laser modes; Light emitting diodes; P-n junctions; Threshold current;
Journal_Title :
Quantum Electronics, IEEE Journal of
DOI :
10.1109/JQE.1979.1070098