Title :
How does the potential get from A to B in a plasma?
Author :
Hershkowitz, Noah
Author_Institution :
Dept. of Nucl. Eng. & Eng. Phys., Wisconsin Univ., Madison, WI, USA
fDate :
2/1/1994 12:00:00 AM
Abstract :
Solutions to the question of how the plasma potential varies from point A to point B, at which the values are specified, are discussed. Each answer depends on plasma and boundary conditions. Plasma potential structures measured by emissive probes are considered. Examples include potentials associated with sheaths and presheaths in collisionless and collisional systems, unmagnetized and magnetized double layers with single and multiple step transitions, semiconductor etching and rf self bias, tandem mirror plasma confinement and tokamak antenna impurity production. DC structures, time average structures associated with capacitive and inductive rf and the role of potential well pumping are considered
Keywords :
magnetic mirrors; plasma collision processes; plasma density; plasma diagnostics; plasma impurities; plasma sheaths; sputter etching; DC structures; RF self bias; collisional systems; collisionless systems; emissive probes; magnetized double layers; plasma potential structures; potential well pumping; presheaths; semiconductor etching; sheaths; step transitions; tandem mirror plasma confinement; time average structures; tokamak antenna impurity production; unmagnetized double layers; Antenna measurements; Boundary conditions; Etching; Magnetic confinement; Magnetic semiconductors; Plasma applications; Plasma confinement; Plasma measurements; Plasma sheaths; Probes;
Journal_Title :
Plasma Science, IEEE Transactions on