• DocumentCode
    1077288
  • Title

    How does the potential get from A to B in a plasma?

  • Author

    Hershkowitz, Noah

  • Author_Institution
    Dept. of Nucl. Eng. & Eng. Phys., Wisconsin Univ., Madison, WI, USA
  • Volume
    22
  • Issue
    1
  • fYear
    1994
  • fDate
    2/1/1994 12:00:00 AM
  • Firstpage
    11
  • Lastpage
    21
  • Abstract
    Solutions to the question of how the plasma potential varies from point A to point B, at which the values are specified, are discussed. Each answer depends on plasma and boundary conditions. Plasma potential structures measured by emissive probes are considered. Examples include potentials associated with sheaths and presheaths in collisionless and collisional systems, unmagnetized and magnetized double layers with single and multiple step transitions, semiconductor etching and rf self bias, tandem mirror plasma confinement and tokamak antenna impurity production. DC structures, time average structures associated with capacitive and inductive rf and the role of potential well pumping are considered
  • Keywords
    magnetic mirrors; plasma collision processes; plasma density; plasma diagnostics; plasma impurities; plasma sheaths; sputter etching; DC structures; RF self bias; collisional systems; collisionless systems; emissive probes; magnetized double layers; plasma potential structures; potential well pumping; presheaths; semiconductor etching; sheaths; step transitions; tandem mirror plasma confinement; time average structures; tokamak antenna impurity production; unmagnetized double layers; Antenna measurements; Boundary conditions; Etching; Magnetic confinement; Magnetic semiconductors; Plasma applications; Plasma confinement; Plasma measurements; Plasma sheaths; Probes;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.281545
  • Filename
    281545