Title :
Off-State Leakage Induced by Band-to-Band Tunneling and Floating-Body Bipolar Effect in InGaAs Quantum-Well MOSFETs
Author :
Jianqiang Lin ; Antoniadis, Dimitri A. ; del Alamo, Jesus A.
Author_Institution :
Microsyst. Technol. Labs., Massachusetts Inst. of Technol., Cambridge, MA, USA
Abstract :
The physics of off-state drain leakage (Ioff) in scaled self-aligned InGaAs quantum-well (QW) MOSFETs is investigated through experiments and simulations. Excess Ioff is observed in InGaAs QW-MOSFETs with very short contact-to-channel spacing. This current bears the marks of band-to-band tunneling (BTBT) that takes place at the drain edge of the channel. However, a pure BTBT current does not explain the observed magnitude of Ioff nor its gate length dependence. For this, we invoke floating-body bipolar amplification of the BTBT current in the QW channel. Device simulations that include BTBT and drift diffusion are consistent with the magnitude of the experimental Ioff and its gate length scaling behavior. The understanding derived here suggests a number of paths to mitigate BTBT-induced off-state current in scaled InGaAs QW-MOSFETs.
Keywords :
III-V semiconductors; MOSFET; gallium arsenide; indium compounds; semiconductor quantum wells; tunnelling; InGaAs; QW channel; band-to-band tunneling; device simulations; drift diffusion; floating-body bipolar amplification; floating-body bipolar effect; gate length dependence; gate length scaling behavior; off-state drain leakage; scaled self-aligned quantum-well MOSFET; very short contact-to-channel spacing; Bipolar transistors; Charge carrier processes; III-V semiconductor materials; Indium gallium arsenide; MOSFET; Quantum wells; BTBT; III-V; bipolar effect; floating body; quantum-well MOSFETs; quantum-well MOSFETs.; self-aligned;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2014.2361528