Title :
Annealing of amorphous silicon with CW infrared lasers
Author :
Celler, G. ; Bean, J. ; Brown, Walter ; Poate, J. ; Rozgonyi, G. ; Sheng, Tiantian
Author_Institution :
Western Electric Engineering Research Center, Princeton, NJ
fDate :
9/1/1979 12:00:00 AM
Keywords :
Amorphous semiconductor materials/devices; Heat treatment; Laser applications, materials processing; Semiconductor defects; Amorphous silicon; Annealing; Laboratories; Laser applications; Laser beams; Laser modes; Pulsed laser deposition; Semiconductor lasers; Solid lasers; Telephony;
Journal_Title :
Quantum Electronics, IEEE Journal of
DOI :
10.1109/JQE.1979.1070201
