DocumentCode
1078394
Title
Annealing of amorphous silicon with CW infrared lasers
Author
Celler, G. ; Bean, J. ; Brown, Walter ; Poate, J. ; Rozgonyi, G. ; Sheng, Tiantian
Author_Institution
Western Electric Engineering Research Center, Princeton, NJ
Volume
15
Issue
9
fYear
1979
fDate
9/1/1979 12:00:00 AM
Firstpage
989
Lastpage
990
Keywords
Amorphous semiconductor materials/devices; Heat treatment; Laser applications, materials processing; Semiconductor defects; Amorphous silicon; Annealing; Laboratories; Laser applications; Laser beams; Laser modes; Pulsed laser deposition; Semiconductor lasers; Solid lasers; Telephony;
fLanguage
English
Journal_Title
Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
0018-9197
Type
jour
DOI
10.1109/JQE.1979.1070201
Filename
1070201
Link To Document