DocumentCode :
1078407
Title :
Transition metal-gate MOS gaseous detectors
Author :
Poteat, T.L. ; Lalevic, Bogoljub
Author_Institution :
Bell Laboratories, Murray Hill, NJ
Volume :
29
Issue :
1
fYear :
1982
fDate :
1/1/1982 12:00:00 AM
Firstpage :
123
Lastpage :
129
Abstract :
MOS capacitors with gates of palladium, platinum, and nickel are shown to be sensitive detectors of H2, CH4, C4H10, and CO gases. 1-MHz and 10-Hz C-V characteristics change by - 1240 and - 215 mV when the Pd-gate MOS capacitor is exposed to H2gas at 760 and 2 × 10-8torr, respectively. Platinum-gate MOS capacitors exhibit approximately one-half the change of Pd-gate devices. Nickel shows a response of - 120 and - 140 mV in 1 atm of H2find CO gas, respectively. When the capacitors are operated in a constant-capacitance mode by varying the bias, absorption time characteristics are obtained. Pd-gate devices absorb H2gas in 190-200 ms at 760 torr of H2but require 200 min to reach 63 percent of the total change at 2 × 10-8torr H2pressure. Both Pt- and Ni-gate devices are slower than Pd. The detection mechanism is attributed to the change in work function upon hydrogen absorption. This is established by demonstrating no change either in the density of interface states or in the distribution across the gap or in the number of states at midgap upon absorption. Also, no accumulation of additional charges in the SiO2or Si3N4dielectric is found upon hydrogenation of devices with either Pd or Pt gates.
Keywords :
Absorption; Capacitance-voltage characteristics; Gas detectors; Gases; Hydrogen; Interface states; MOS capacitors; Nickel; Palladium; Platinum;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1982.20668
Filename :
1482165
Link To Document :
بازگشت